期刊
MICROELECTRONIC ENGINEERING
卷 86, 期 4-6, 页码 745-748出版社
ELSEVIER
DOI: 10.1016/j.mee.2008.12.044
关键词
Hybrid organic-inorganic materials; Sol-gel; Glycidoxypropyltrimethoxysilane; Epoxy; Electron beam lithography
The direct pattering process here described is proposed as an alternative to conventional multi step nano-fabrication techniques, merging materials with novel functional properties and the simplification of the fabrication processes. We report the use of an innovative hybrid sol-gel material working as negative resists for EBL lithography and showing a resolution better than 100 nm. Tailoring the optical and mechanical properties, few examples of photonic nanostructure were fabricated with a simple e-beam exposure that greatly simplify the nanofabrication process. (C) 2008 Elsevier B.V. All rights reserved.
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