期刊
MICROELECTRONIC ENGINEERING
卷 86, 期 4-6, 页码 1282-1285出版社
ELSEVIER SCIENCE BV
DOI: 10.1016/j.mee.2008.11.045
关键词
Gold cleaning; Electrochemistry; Cyclic voltammetry; Impedance spectroscopy
This work investigates methods for obtaining reliably clean gold film surfaces. Nine gold cleaning methods are investigated here: UV ozone photoreactor; potassium hydroxide-hydrogen peroxide; potassium hydroxide potential sweep; sulfuric acid hydrogen peroxide; sulfuric acid potential cycling; hydrochloric acid potential cycling; dimethylamine borane reducing agent solutions at 25 and 65 degrees C; and a dilute form of Aqua Regia. Peak-current potential-differences obtained from cyclic voltammetry and charge transfer resistance obtained from electrochemical impedance spectroscopy, as well as X-ray photo-electron spectroscopy are used to characterize surface cleanliness. A low peak-current potential-difference and charge transfer resistance indicates a cleaner surface, as does a higher percentage of elemental gold on the electrode surface. The potassium hydroxide potential sweep method is found to leave the gold surface the cleanest overall. (C) 2008 Elsevier B.V. All rights reserved.
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