期刊
MICROELECTRONIC ENGINEERING
卷 86, 期 7-9, 页码 1689-1691出版社
ELSEVIER SCIENCE BV
DOI: 10.1016/j.mee.2009.03.103
关键词
High permittivity dielectrics; Atomic layer deposition; Electrical characterization
Electrical characterization of zirconium oxide (ZrO2) based metal-oxide-semiconductor (MOS) structures has been carried out. ZrO2 films have been atomic layer deposited (ALD) by using novel cyclopentadienyl-based precursors, which have recently revealed themselves as very adequate in terms of thermal stability and high permittivity of the dielectrics deposited. Our results demonstrate good quality of the films, especially when mixed alkylamido-cyclopentadienyl precursors are used on SiO2/Si substrates. Conduction mechanisms in these MIS capacitors were studied, with moderately or highly-doped silicon used as substrate. (C) 2009 Elsevier B.V. All rights reserved.
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