期刊
MICROELECTRONIC ENGINEERING
卷 85, 期 5-6, 页码 1124-1127出版社
ELSEVIER SCIENCE BV
DOI: 10.1016/j.mee.2007.12.032
关键词
plasma etching; PMMA; microfluidics; superhydrophilic; superhydrophobic; electroosmotic flow; flow in superhydrophobic channels
We report on the fabrication and electrokinetic characterization of poly-methyl methacrylate (PMMA) microfluidics by deep O-2 plasma etching, utilizing a photosensitive poly-(dimethyl siloxane) (PDMS) as a resist (in situ mask). The mass production amenability, the high throughput without the use of mold, the dry character along with the flexibility to control surface properties towards specific demands are some of the advantages of this method. Intense ion bombardment ensures high etch rates (similar to 1.5 mu m/min) and anisotropy. A PMMA lid was thermally bonded to the plasma fabricated microchannel under 1.8 kg/cm(2) at 120 degrees C. Surface roughness and hydrophilization are some unique features induced by plasma processing, affecting the electrokinetic performance of the microfluidic and resulting in relatively high electroosmotic flow (EOF) mobilities of 2.83 x 10(-4) cm(2)/V s. Teflon-like coating deposition on the engraved part modified the surface into a super-hydrophobic and resulted in even higher EOF mobility (3.89 x 10-4 cm(2)/V S), thus proposing an alternative means in microfluidic surface modification and EOF control. (C) 2007 Elsevier B.V. All rights reserved.
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