4.4 Article Proceedings Paper

Measurement of demolding forces in full wafer thermal nanoimprint

期刊

MICROELECTRONIC ENGINEERING
卷 85, 期 5-6, 页码 907-909

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ELSEVIER SCIENCE BV
DOI: 10.1016/j.mee.2008.01.086

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nanoimprint lithography; force history; demolding force

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The Jenoptik HEX03 embossing machine has been used in a slightly modified setup to measure the demolding forces online. We optimized the demolding setup to be able to compare ideal demolding processes with a range of process parameters, i.e. pattern design, structure depth and demolding temperature. The demolding force can be deduced from discontinuities of the force recording; these discontinuities, seen as characteristic kinks in the force curve, stem from a sudden release of the stamp from the polymer and the subsequent relaxation of the press column. In this research, we demonstrate that these forces are actual demolding forces. (c) 2008 Published by Elsevier B.V.

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