期刊
MICROELECTRONIC ENGINEERING
卷 85, 期 5-6, 页码 1089-1091出版社
ELSEVIER SCIENCE BV
DOI: 10.1016/j.mee.2008.01.011
关键词
antireflection; microlenses; interferometric lithography
Herein, a study of combining refractive microlenses arrays and nanostructured antireflective surfaces is presented. Fabrication method is surveyed for obtaining the hybrid surface with functionalities of refractive and antireflective (high-transmissive) element. A standard re-flow method is used for fabricating the microlenses and the subwavelength structure is generated oil the curved surfaces by interference lithography. By using an optical fiber detector the increased transmittance over the whole visible spectrum is shown. This kind a hybrid element could have applications in illumination systems, in which the main purpose is to gather light to certain areas. (C) 2008 Elsevier B.V. All rights reserved.
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