期刊
METALS AND MATERIALS INTERNATIONAL
卷 18, 期 6, 页码 957-964出版社
KOREAN INST METALS MATERIALS
DOI: 10.1007/s12540-012-6007-2
关键词
thin films; sputtering; corrosion; crystal structure; X-ray diffraction
资金
- Department of Atomic Energy (DAE), Board of Research in Nuclear Sciences (BRNS), Mumbai [2006/37/37/BRNS/2068]
- Japan Society for the Promotion of Science, Japan
Thin films of Zirconium Nitride (ZrN) were deposited by DC magnetron sputtering. The structure of the films was examined by X-ray diffraction and the crystallographic parameters were refined by Rietveld analysis. The columnar micro-structure was observed via cross-sectional SEM analysis. Defect induced, first order spectra were observed from Laser Raman studies. XPS showed the presence of Zr (N,O) ZrO2 phases on the surface of the film. The pitting corrosion was substantially reduced by the employment of Zr film as an interlayer. Corrosion tests revealed that ZrN films with a Zr interlayer exhibited clear passivation characteristics with considerably better corrosion resistance than the film without an interlayer.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据