期刊
APPLIED SURFACE SCIENCE
卷 357, 期 -, 页码 622-625出版社
ELSEVIER
DOI: 10.1016/j.apsusc.2015.09.080
关键词
Nb-doped TiO2; Transparent conductive oxides; Co sputtering; Thin films
类别
资金
- National Science Foundation of China [60977017, 61275058]
- Fundamental Research Funds for the Central Universities [2013JBM101]
- Key Laboratory of Luminescence and Optical Information of China in Beijing Jiaotong University
In this work, Nb-doped TiO2 films were deposited on glass substrates utilizing RF magnetron co-sputtering with a TiO2 target and a Nb target. In order to study the effect of Nb concentration, four groups of films with different Nb concentration were prepared and annealed in N-2 at 500 degrees C. Crystal structure, surface morphology, electrical and optical property of the films were characterized. The lowest resistivity was measured to be 1.2 x 10(-3) Omega cm at the Nb concentration of 7.0 at.%. Meanwhile, Hall mobility and carrier density were 2.0 cm(2)/Vs and 2.6 x 10(21) cm(-3), respectively. (C) 2015 Elsevier B.V. All rights reserved.
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