4.7 Article

Fractal features of CdTe thin films grown by RF magnetron sputtering

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APPLIED SURFACE SCIENCE
卷 357, 期 -, 页码 1843-1848

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ELSEVIER
DOI: 10.1016/j.apsusc.2015.09.048

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Sputtering; CdTe; Thin films; Surface morphology; Fractal; MFDFA

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Cadmium telluride (CdTe) thin films were prepared by RF magnetron sputtering on glass substrates at room temperature (RT). The film deposition was performed for 5, 10, and 15 min at power of 30W with a frequency of 13.56 MHz. The crystal structure of the prepared CdTe thin films was studied by X-ray diffraction (XRD) technique. XRD analyses indicate that the CdTe films are polycrystalline, having zinc blende structure of CdTe irrespective of their deposition time. All CdTe films showed a preferred orientation along (1 1 1) crystalline plane. The surface morphology characterization of the films was studied using atomic force microscopy (AFM). The quantitative AFM characterization shows that the RMS surface roughness of the prepared CdTe thin films increases with increasing the deposition time. The detrended fluctuation analysis (DFA) and also multifractal detrended fluctuation analysis (MFDFA) methods showed that prepared CdTe thin films have multifractal nature. The complexity, roughness of the CdTe thin films and strength of the multifractality increase as deposition time increases. (C) 2015 Elsevier B.V. All rights reserved.

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