期刊
MATERIALS TRANSACTIONS
卷 51, 期 4, 页码 659-663出版社
JAPAN INST METALS & MATERIALS
DOI: 10.2320/matertrans.MG200910
关键词
electron backscatter diffraction; copper film; columnar grain structure; high-angle grain boundary; twin boundary; annealing; grain growth; annealing twinning
资金
- Ministry of Knowledge Economy, Korea
The microstructure evolution of electroplated copper films was characterized by electron backscatter diffraction (EBSD). Special care was taken during the preparation of the cross-sectional specimens and microstructure analysis to obtain reliable results. The film exhibited a columnar grain structure with a large fraction of twin boundaries. Annealing induced normal grain growth and caused many of the general high-angle grain boundaries to be replaced by twin boundaries, possibly by annealing twinning. [doi:10.2320/matertrans.MG200910]
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