Chemical vapor deposition of boron- and nitrogen-containing graphene thin films

Boron and nitrogen-incorporated graphene thin films were grown on polycrystalline Ni substrates by thermal chemical vapor deposition using separate boron- and nitrogen-containing feedstocks. Boron and nitrogen atoms were incorporated in the film in almost equal amounts and the total content reached similar to 28%. The film predominantly consisted of separate graphene and boron nitride domains. Carrier concentration in the graphene domains was estimated to be about 1 x 10(-3) e/atom (3.8 x 10(12) cm(-2)) from G band shift in Raman spectra. (C) 2011 Elsevier B.V. All rights reserved.