期刊
MATERIALS RESEARCH-IBERO-AMERICAN JOURNAL OF MATERIALS
卷 17, 期 6, 页码 1384-1390出版社
UNIV FED SAO CARLOS, DEPT ENGENHARIA MATERIALS
DOI: 10.1590/1516-1439.281214
关键词
ZnO:Al; RF magnetron sputtering; surface morphology; optical transmittance; electrical resistivity
资金
- Brazilian agency FAPESP [2008/53311-5, 2011/21345-0]
- Brazilian agency CNPq [555774/2010-4, 301622/2012-4]
In this work, the surface and electrical characteristics ZnO:Al thin films deposited by RF magnetron sputtering onto glass substrates have been investigated. Analysis of surface morphologies revealed two growth stages. In the first stage, up to thicknesses of 100 nm, the films show surface structures with a granular form without preferential orientation. Beyond thicknesses of 100 nm, however, the grain structures increase in size and height, producing a pyramidal form and preferred orientation along the c-axis. The XRD results show that the films have a preferred orientation in the (002) plane. Furthermore, with the evolution of the film thickness the electrical resistivity decreases to a minimum of 1.6 x 10(-3) Omega cm for the film of 465 nm thickness. The doping with aluminum atoms produces an increase in concentration of charge carriers to around 8.8 x 10(19) cm(-3). All films exhibit high optical transmittance (above 85%) in the visible region.
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