期刊
MATERIALS RESEARCH BULLETIN
卷 50, 期 -, 页码 57-62出版社
PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.materresbull.2013.09.023
关键词
Nitrides; Vapor deposition; Electron microscopy; X-ray diffraction; Microstructure
资金
- Natural Science Foundation of Hebei Province [E2012403007]
- Foundation of Hebei Education Committee [Q2012016]
In this study, we provided a reliable chemical vapor deposition (CVD) method to synthesize high-purity Si3N4 microcoils in high yield without the presence of catalyst. The achieved products were characterized by X-ray diffraction, scanning electron microscopy, and transmission electron microscope. The results indicated that the yield and morphology of Si3N4 products were influenced by the synthesis parameters such as reaction temperature, reaction time and gas flow rate. The particular conditions favorable to high yield synthesis of Si3N4 microcoils were obtained through a series of control experiments. Furthermore, the growth of Si3N4 microcoils was supposed to be in accord with vapor-solid (VS) growth process and the different growth rates between the amorphous layer and the crystalline layer were used to explain the formation of the coil geometry. (C) 2013 Elsevier Ltd. All rights reserved.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据