4.6 Article

Preparation of grass-like GaN nanostructures: Its PL and excellent field emission properties

期刊

MATERIALS LETTERS
卷 66, 期 1, 页码 50-53

出版社

ELSEVIER
DOI: 10.1016/j.matlet.2011.08.049

关键词

Grass-like GaN; Semiconductors; Chemical vapor deposition; Field emission properties

资金

  1. National Natural Science Foundation of China [50972017]
  2. Research Fund for the Doctoral Program of Higher Education of China [20060007024]

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We here report highly pure and single crystalline grass-like gallium nitride (GaN) nanostructures obtained on silicon substrate via catalyst-assisted CVD route under NH3 atmosphere inside horizontal tube furnace (HTF) by pre-treating the precursors with aqueous NH3. The as-obtained GaN nanostructures were characterized by XRD, SEM, EDS. HRTEM and SAED. The field emission (FE) characteristics of grass-like GaN nanostructures exhibited a turn-on field of 7.82 V mu m(-1) and a threshold field of 8.96 V mu m(-1) which are quite reasonable for applications in electron emission devices, field emission displays and vacuum microelectronic devices. Room temperature photoluminescence (PL) measurements of grass-like GaN nanostructures exhibited a strong near-band-edge emission at 368.8 nm (3.36 eV) without any defects related emissions which shows its potential applications in optoelectronics. (C) 2011 Elsevier B.V. All rights reserved.

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