Microstructure, physical and chemical properties of nanostructured (Ti-Hf-Zr-V-Nb)N coatings under different deposition conditions

High-entropy alloy and nitride coatings (TiHfZrVNb)N were prepared by the cathodic-arc-vapor-deposition method under various deposition conditions. The composition, crystal structure, strain-stress state, profiles of defects and atoms in-depth and at surfaces of the (TiHfZrVNb)N coatings were characterized by EDS and SEM analysis, X-ray diffraction with alpha-sin(2)psi method of measurements and slow positron beam. The oxidation behavior of nitride films after annealing at 600 degrees C temperature was studied. The results indicate that nitride coatings show the face-centered cubic crystal structure. The redistributions of elements and defects, their arrangement (segregation) due to the thermally stimulated diffusion and termination of the spinodal segregation near the interfaces, around the grains and subgrains were found. The peak hardness and modulus of the nitride films were 44.3 and 384 GPa, respectively. The tribological properties of the (TiHfZrVNb)N coatings against AISI 1045 were evaluated by a ball-on-disc tribometer with a 3.0 N applied load. (C) 2014 Elsevier B.V. All rights reserved.