Self-assembled monolayer-modified block copolymers for chemical surface nanopatterning

Thin-film poly(styrene-block-methyl methacrylate) diblock copolymer (PS-b-PMMA) is used to create chemically patterned surfaces via metal deposition combined with self-assembled monolayers (SAMs) and UV exposure. We use this method to produce surfaces that are chemically striped on the scale of a few tens of nanometers. Atomic force and transmission electron microscopies are used to verify the spatially localized organization of materials, and contact angle measurements confirm the chemical tunability of these scaffolds. These surfaces may be used for arraying nanoscale objects, such as nanoparticles or biological species, or for electronic, magnetic memory or photovoltaic applications. (C) 2010 Elsevier B.V. All rights reserved.