Functionalized Nanoporous Thin Films From Photocleavable Block Copolymers

A polystyrene-block-poly(ethylene oxide) block copolymer bearing a photocleavable junction between the blocks is used to form nanoporous thin films with carboxylic acid functions homogeneously distributed on the pore walls. The presence of the carboxylic acid groups is evidenced by fluorescence spectroscopy after their reaction with a diazomethane functionalized fluorescent dye. In addition, the initial light-responsive thin film, acting as a photoresist, can be easily patterned to selectively generate porosity in predetermined areas. In that way, fluorescent patterns can be obtained as evidenced by fluorescent microscopy.