4.7 Article

One-step synthesis of chlorinated graphene by plasma enhanced chemical vapor deposition

期刊

APPLIED SURFACE SCIENCE
卷 347, 期 -, 页码 632-635

出版社

ELSEVIER SCIENCE BV
DOI: 10.1016/j.apsusc.2015.04.147

关键词

Graphene; Chlorination; Plasma; p-type

资金

  1. Natural Science Foundation of China (NSFC) [91333112, U1432249]
  2. Priority Academic Program Development of Jiangsu Higher Education Institutions
  3. Jiangsu Key Laboratory for Carbon-Based Functional Materials and Devices
  4. Collaborative Innovation Center of Suzhou Nano Science Technology
  5. Qing Lan Project

向作者/读者索取更多资源

We developed an approach to synthesize the chlorinated single layer graphene (CI-G) by one-step plasma enhanced chemical vapor deposition. Copper foil was simply treated with hydrochloric acid and then CuCl2 formed on the surface was used as Cl source under the assistance of plasma treatment. Compared with other two-step methods by post plasma/photochemical treatment of CVD-grown single layer graphene (SLG), one-step CI-G synthesis approach is quite straightforward and effective. X-ray photoelectron spectroscopy (XPS) revealed that similar to 2.45 atom% Cl remained in SLG. Compared with the pristine SLG, the obvious blue shifts of G band and 2D band along with the appearance of D' band and D + G band in the Raman spectra indicate p-type doping of CI-G. (C) 2015 Elsevier B.V. All rights reserved.

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