期刊
LANGMUIR
卷 29, 期 21, 页码 6317-6322出版社
AMER CHEMICAL SOC
DOI: 10.1021/la400507n
关键词
-
资金
- German-Israeli Foundation [I-1045-82.14/2009]
- Israeli Science Foundation [1403/12]
AFM measurements of the force acting between silica surfaces in the presence of varied alkali chloride salts and pH's elucidate the origin of the Hofmeister adsorption series and its reversal. At low pH, electrostatics is shown to be insignificant The preferential adsorption of Cs+ to the silica surface is traced to the weak hydration of neutral silanols and the resulting hydrophobic expulsion of weakly hydrated ions from bulk solution to the interface. The same interactions keep the strongly hydrated Na+ and Li+ in solution. As pH is increased, a tightly bound hydration layer forms on deprotonating silanols Cs+ is correspondingly expelled from the surface, and adsorption of small ions is encouraged. The deduced role of surface hydration is corroborated by hydration repulsion observed at high pH, surface overcharging at low pH, and data in other oxides.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据