期刊
LANGMUIR
卷 29, 期 14, 页码 4543-4550出版社
AMER CHEMICAL SOC
DOI: 10.1021/la400148h
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资金
- German Federal Ministry of Education and Research [03 X 0107B]
- German Research Foundation (DFG) in the framework of the Collaborative Research Centre [SFB 1027]
- DFG [JA905/3]
- Saarland University and Saarland Ministry of Economy
- German Research Foundation (DFG)
The wear resistance of a Rh(111) surface can be strongly increased by interstitial alloying with boron atoms via chemical vapor deposition of trimethylborate [B(OCH3)(3)] at moderate temperatures of about 800 K. The fragmentation of the precursor results in single boron atoms that are incorporated in the fcc lattice of the substrate, as displayed by X-ray photoelectron diffraction. The penetration depth of the boron atoms is in the range of at least 100 nm with the boron distribution displaying a nearly homogeneous depth profile, as examined by combined X-ray photoelectron spectroscopy and Ar ion etching experiments. Compared to the bare Rh(111) surface, the wear resistance of the boron-doped Rh surface is increased to about 400%, as probed by the scratching experiments with atomic force microscopy. The presented synthesis route provides an easy method for case hardening of micro- or nanoelectromechanical devices (MEMS and NEMS, respectively) at moderate temperatures.
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