Using a single mask to create multiple patterns in three-component, photoreactive blends

Via simulations, we demonstrate a simple route for forming defect-free patterns in a photosensitive, immiscible ABC blend. The first pattern is established by irradiating the sample through a mask, which serves to pin the C regions and thereby promotes the self-assembly of A and B into ordered domains. When the mask is removed, the photoactivity of the AB blend leads to different periodic patterns. Thus, the use of one mask permits the creation of multiple ordered morphologies, which can be locked into the film by quenching the system at the appropriate time.