期刊
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
卷 26, 期 6, 页码 2562-2566出版社
A V S AMER INST PHYSICS
DOI: 10.1116/1.2981076
关键词
anodisation; elemental semiconductors; masks; nanolithography; nanoporous materials; organic semiconductors; polymers; silicon; soft lithography; solar cells; sputter etching
Nanoimprint with a large-scale nanoporous Si mold is developed to fabricate high density periodic nanopillars (similar to 10(10)/cm(2)) in various functional polymers. A anodic alumina membrane is first obtained using electrochemical anodization. The membrane is used as a mask for a two-step plasma etching process to obtain a Si mold of 50-80 nm wide and 100-900 nm deep pores. The mold is used in nanoimprint lithography to fabricate ordered and high density polymer nanopillars and nanopores in SU-8, hydrogen silsesquixane, polymethylmethacrylate, poly(3-hexylthiophane) (P3HT), and phenyl-C61-butyric acid methyl ester (PCBM). Then, the imprinted P3HT nanopillars were used to make bulk heterojunction solar cells by depositing PCBM on top of the pillars. Imprinting provides a way to precisely control the interdigitized heterojunction morphology, leading to improved solar cell performance.
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