4.5 Article

Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study

期刊

出版社

A V S AMER INST PHYSICS
DOI: 10.1116/1.3659699

关键词

-

资金

  1. Academy of Finland [128805]
  2. Academy of Finland (AKA) [128805, 128805] Funding Source: Academy of Finland (AKA)

向作者/读者索取更多资源

In total, five metal oxide and one metal plasma-enhanced atomic layer deposition (PEALD) processes were studied with respect to the conformality of the coatings. The study reveals that also high aspect ratio structures (up to 60:1) can be coated conformally with remote PEALD. Oxides could relatively easily be deposited into demanding 3D structures with rather short cycle times but not the silver metal. The key factor in achieving excellent conformality seems to be that sufficient radical density is required to overcome the loss of radicals by recombination. In the case of metals where hydrogen plasma is applied the recombination of hydrogen radicals causes major difficulties in obtaining perfect conformality. (C) 2012 American Vacuum Society. [DOI: 10.1116/1.3659699]

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.5
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据