4.6 Article

Reducing intrinsic loss in superconducting resonators by surface treatment and deep etching of silicon substrates

期刊

APPLIED PHYSICS LETTERS
卷 106, 期 18, 页码 -

出版社

AMER INST PHYSICS
DOI: 10.1063/1.4919761

关键词

-

资金

  1. Dutch Organization for Fundamental Research on Matter (FOM)
  2. Marie Curie Career Integration Grant

向作者/读者索取更多资源

We present microwave-frequency NbTiN resonators on silicon, systematically achieving internal quality factors above 1M in the quantum regime. We use two techniques to reduce losses associated with two-level systems: an additional substrate surface treatment prior to NbTiN deposition to optimize the metal-substrate interface and deep reactive-ion etching of the substrate to displace the substrate-vacuum interfaces away from high electric fields. The temperature and power dependence of resonator behavior indicate that two-level systems still contribute significantly to energy dissipation, suggesting that more interface optimization could further improve performance. (C) 2015 AIP Publishing LLC.

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.6
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据