期刊
APPLIED PHYSICS LETTERS
卷 106, 期 4, 页码 -出版社
AMER INST PHYSICS
DOI: 10.1063/1.4907261
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资金
- U.K. Engineering and Physics Sciences Research Council (EPSRC) [EP/K026232, EP/K024345]
- Engineering and Physical Sciences Research Council [EP/L007010/1, EP/K024345/1, EP/K026232/1] Funding Source: researchfish
- EPSRC [EP/L007010/1, EP/K026232/1, EP/K024345/1] Funding Source: UKRI
Gate leakage degradation of AlGaN/GaN high electron mobility transistors under OFF-state stress is investigated using a combination of electrical, optical, and surface morphology characterizations. The generation of leakage hot spots at the edge of the gate is found to be strongly temperature accelerated. The time for the formation of each failure site follows a Weibull distribution with a shape parameter in the range of 0.7-0.9 from room temperature up to 120 degrees C. The average leakage per failure site is only weakly temperature dependent. The stress-induced structural degradation at the leakage sites exhibits a temperature dependence in the surface morphology, which is consistent with a surface defect generation process involving temperature-associated changes in the breakdown sites. (C) 2015 AIP Publishing LLC.
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