期刊
JOURNAL OF THE MECHANICS AND PHYSICS OF SOLIDS
卷 59, 期 3, 页码 610-624出版社
PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.jmps.2010.12.009
关键词
Thin film; Soft matter; Surface instability; Van der Waals force; Surface effect
资金
- National Natural Science Foundation of China [10732050, 10872116]
- MOST [2010CB631005]
The linear bifurcation theory is used to investigate the stability of soft thin films bonded to curved substrates. It is found that such a film can spontaneously lose its stability due to van der Waals or electrostatic interaction when its thickness reduces to the order of microns or nanometers. We first present the generic method for analyzing the surface stability of a thin film interacting with the substrate and then discuss several important geometric configurations with either a positive or negative mean curvature. The critical conditions for the onset of spontaneous instability in these representative examples are established analytically. Besides the surface energy and Poisson's ratio of the thin film, the curvature of the substrate is demonstrated to have a significant influence on the wrinkling behavior of the film. The results suggest that one may fabricate nanopatterns or enhance the surface stability of soft thin films on curved solid surfaces by modulating the mechanical properties of the films and/or such geometrical properties as film thickness and substrate curvature. This study can also help to understand various phenomena associated with surface instability. (C) 2010 Elsevier Ltd. All rights reserved.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据