期刊
JOURNAL OF THE KOREAN PHYSICAL SOCIETY
卷 56, 期 4, 页码 1097-1102出版社
KOREAN PHYSICAL SOC
DOI: 10.3938/jkps.56.1097
关键词
Graphene oxide; Thermal and ultrasonic treatment; TEM; Raman; AFM
资金
- ACT [10026688]
- Ministry of Knowledge Economy
Thermal and ultrasonic treatments of grapheme oxide (GO) are proposed to produce graphene-oxide layers. These layers were comprehensively characterized by using X-ray diffraction (XRD), Fourier transform infrared (FT-IR) spectroscopy, scanning electron microscopy (SEM), energy dispersive X-ray (EDX) analysis, transmission electron microscopy (TEM), Raman spectroscopy, and Atomic Force Microscopy (AFM). The XRD patterns of the GO layers produced by using thermal treatment showed a broad peak at around 26.09 degrees, and those of the GO layers produced by using ultrasonic treatment showed a distinct peak at 11.07 degrees. The FT-IR, spectra indicated that the ultrasonic treatments for the sample GO did not change the functional group; however, all oxygen-containing functional groups in the CO layers produced by using thermal treatment were nearly completely removed. The EDX results showed that only 8.6 wt.% oxygen still existed in the sample of CO layers produced by using thermal treatment. From the TEM images, monolayer graphene oxide could be found in a flake form in the GO layers by thermal treatment. The visible D peak, the clear G peak and the characterized 2D band in the Raman spectra indicate the existence of defect-free monolayer and few-layer graphenes. A FM results showed that a single layer of thermally treated grapheme oxide had been produced.
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