期刊
JOURNAL OF THE EUROPEAN CERAMIC SOCIETY
卷 29, 期 5, 页码 919-924出版社
ELSEVIER SCI LTD
DOI: 10.1016/j.jeurceramsoc.2008.07.008
关键词
Stereolithography; Scattering; Alumina; Kubelka-Munk
The multiple light scattering in concentrated alumina suspensions adapted to stereolithography can be modeled using diffuse reflectance measurements coupled to the Kubelka-Munk model. The penetration depth of UV radiation can be related to the scattering coefficient allowing the prediction of the cure depth with an accuracy of 20%. (c) 2008 Elsevier Ltd. All rights reserved.
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