4.6 Article

Atomic Layer Deposition of Ta-doped TiO2 Electrodes for Dye-Sensitized Solar Cells

期刊

JOURNAL OF THE ELECTROCHEMICAL SOCIETY
卷 158, 期 6, 页码 B749-B753

出版社

ELECTROCHEMICAL SOC INC
DOI: 10.1149/1.3582765

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资金

  1. Ministry of Education, Science and Technology [2010-0001-226]
  2. Ministry of Knowledge Economy, Republic of Korea
  3. Korea Evaluation Institute of Industrial Technology (KEIT) [K0006075] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
  4. National Research Foundation of Korea [2006-0051992] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)

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Ta-doped TiO2 inverse opals were obtained by selective etching of a silica template after atomic layer deposition (ALD) of Ta-doped TiO2 films and were applied as an electrode for dye-sensitized solar cells (DSSCs). Ta content in the Ta-doped TiO2 film was controlled by the Ta/(Ta+Ti) unitcycle ratios in the Ta-TiO2 supercycle of ALD. Also, excellent step coverage of nearly 100% in the inverse opal structure was confirmed by field-emission scanning electron microscopy (FE-SEM). Maximum photo-conversion efficiency of 1.56% was achieved with the Ta (3.4 atom %)-doped TiO2 inverse opal electrode due to increased photocurrent density. However, further Ta doping (> 4.9 atom %) decreased the J(sc) and photoconversion efficiency. (C) 2011 The Electrochemical Society. [DOI: 10.1149/1.3582765] All rights reserved.

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