期刊
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY
卷 135, 期 5, 页码 1912-1918出版社
AMER CHEMICAL SOC
DOI: 10.1021/ja3110279
关键词
-
资金
- Australian Research Council
- CSIRO's OCE Science Leadership Program
- University of Sydney International Scholarship
- CSIRO OCE top-up scholarship
A multiscale, multiphase thermokinetic model is used to show the effective control of the growth orientation of thin Si NWs for nanoelectronic devices enabled by nanoscale plasma chemistry. It is shown that very thin Si NWs with [110] growth direction can nucleate at much lower process temperatures and pressures compared to thermal chemical vapor deposition where [111]-directed Si NWs are predominantly grown. These findings explain a host of experimental results and offer the possibility of energy- and matter-efficient, size- and orientation-controlled growth of [110] Si NWs for next-generation nanodevices.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据