期刊
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY
卷 133, 期 31, 页码 11868-11871出版社
AMER CHEMICAL SOC
DOI: 10.1021/ja2038886
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资金
- University of Pittsburgh
We demonstrate a new approach to pattern transfer for bottom-up nanofabrication. We show that DNA promotes/inhibits the etching of SiO2 at the single-molecule level, resulting in negative/positive tone pattern transfers from DNA to the SiO2 substrate.
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