4.8 Article

Traversing the Top-Down/Bottom-Up Divide: Molecular-Scale Lithography of Self-Assembled Ribbons

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JOURNAL OF THE AMERICAN CHEMICAL SOCIETY
卷 131, 期 2, 页码 398-+

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AMER CHEMICAL SOC
DOI: 10.1021/ja805319k

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  1. U.S. NSF [CMMI-0600600]
  2. Semiconductor Research Corporation

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Use of graphitic (hexabenzocoronene-derived) molecules produces cholesteric ribbons which serve as molecular resists in a fluorine plasma. This procedure allows the shape of the molecular assemblies to be etched into the underlying silicon, validating the concept of molecular resists.

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