期刊
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY
卷 131, 期 6, 页码 2102-+出版社
AMER CHEMICAL SOC
DOI: 10.1021/ja8099954
关键词
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资金
- MARCO/MSD
- Intel Corporation
- BSAC
- NSF
Large-area, patterned printing of nanowires by using fluorinated self-assembled monolayers as the resist layer is demonstrated. By projecting a light pattern on the surface of the monolayer resist in an oxygen-rich environment, sticky and nonsticky regions on the surface are directly defined in a single-step process which then enables the highly specific and patterned transfer of the nanowires by the contact printing process, without the need for a subsequent lift-off step. This work demonstrates a simple route toward scalable, patterned printing of nanowires on substrates by utilizing light-tunable, nanoscale chemical interactions and demonstrates the versatility of molecular monolayers for use as a resist layer.
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