The chemical vapor deposition of nickel phosphide or selenide thin films from a single precursor

Nickel phosphide, nickel selenide thin films and their heterostructure (Ni0.85Se/Ni2P) were deposited from a newly synthesized single source precursor {Ni[(Pr2P)-Pr-i(S)NP(Se)Pr-i(2)](2)} just by altering the deposition temperature using CVD.