期刊
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY
卷 130, 期 29, 页码 9224-+出版社
AMER CHEMICAL SOC
DOI: 10.1021/ja8032907
关键词
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We have demonstrated a low-temperature wafer-scale etching and thin film deposition method for fabricating silicon n-p core-shell nanowire solar cells. Our devices showed efficiencies up to nearly 0.5%, limited primarily by interfacial recombination and high series resistance. Surface passivation and contact optimization will be critical to improve device performance in the future.
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