期刊
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING
卷 121, 期 2, 页码 371-375出版社
SPRINGER
DOI: 10.1007/s00339-015-9195-z
关键词
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资金
- National Basic Research Program of China (973 Program) [2013cb632702]
- National Nature Science Foundation of China [51473076]
- Priority Academic Program Development of Jiangsu Higher Education Institutions
- RFDP
A thin and uniform residual layer, especially zero-residual layer, is highly desired in the nanoimprint lithography, because it is critical to the succeeding pattern transfer process. In this study, a partial cavity filling method was applied on UV-curable resins instead of thermal plastic polymer to realize zero-residual layer based on a hybrid nanoimprint technique. The initial thickness of the UV-curable resin on the substrate was precisely quantified less than the cavity volume of the imprint mold by adjusting the resin concentration and spin coating speed. A near-zero-residual layer was successfully achieved under an extremely low imprint pressure by the control of the viscosity, surface tension and thickness of the UV-curable resist.
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