期刊
JOURNAL OF POWER SOURCES
卷 180, 期 1, 页码 576-581出版社
ELSEVIER SCIENCE BV
DOI: 10.1016/j.jpowsour.2008.02.049
关键词
LiMn2O4 thin film; radio frequency magnetron sputtering; chemical diffusion coefficient; cyclic voltammetry; potentiostatic intermittent titration technique; electrochemical impedance spectroscopy
LiMn2O4 thin films were deposited on silica glass substrates by radio frequency (RF) magnetron sputtering. The films were characterized by X-ray diffraction (XRD) and scanning electron microscope (SEM). Li-ion chemical diffusion coefficients (D) over tilde (Li) were measured by cyclic voltammetry (CV), potentiostatic intermittent titration technique (PITT), electrochemical impedance spectroscopy (EIS) and limiting current density (LCD). The (D) over tilde (Li) values depended on the content of Li in LixMn2O4. It was found that the (D) over tilde (Li) values by CV, PITT and LCD were in the order of 10(-10), 10(-11) and 10(-12) cm(2) s(-1), respectively, and those by EIS were in the range of 10(-9) to 10(-11) cm(2) s(-1). The (D) over tilde (Li) values obtained by above methods were compared with those by an electron blocking method. It turned out that the (D) over tilde (Li) values by the electron blocking method were more comparable with those by EIS. (C) 2008 Elsevier B.V. All rights reserved.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据