4.6 Article

Epitaxial graphene on SiC: from carrier density engineering to quasi-free standing graphene by atomic intercalation

期刊

出版社

IOP PUBLISHING LTD
DOI: 10.1088/0022-3727/47/9/094013

关键词

-

资金

  1. Deutsche Forschungsgemeinschaft within the framework of the Priority Programme 1459 Graphene [Sta315/8-1]
  2. European Community [226716]
  3. staff at MAX-Lab (Lund, Sweden)
  4. staff at SLS (Villigen, Switzerland)

向作者/读者索取更多资源

Epitaxial graphene (EG) on SiC has been proven to be an excellent material to investigate the fundamental physical properties of graphene and also to directly implement new findings into devices realized on the versatile platform of SiC. Within this framework, this work aims to review some of the recent major achievements accomplished in the field of EG on SiC, related to the growth of EG on the SiC(0 0 0 1) surface, the control of its doping level, the decoupling of the graphene from the substrate and the intercalation of foreign atomic species at the interface.

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.6
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据