Properties of TiN/TiCN multilayer films by direct current magnetron sputtering

In this work, a TiN/TiCN multilayer film was deposited by direct current magnetron sputtering. Its thickness was about 9675 nm and the bilayer numbers were 10. The composition, crystalline structure and amorphous carbon (a-C) phase of the film were investigated by x-ray photoelectron spectroscopy, x-ray diffraction and Raman spectroscopy. Field emission scanning electron microscopy was employed to observe the inner structure of the film. The TiCN layer exhibited a glass-like structure and the TiN layer presented a columnar structure. The adhesion force between the film and the substrate was 37.8N determined by scratch tests. The hardness of the uppermost TiCN layer and the total film was 34.22 GPa and 27.22 GPa obtained by nano-indentation tests, respectively. In addition, the TiN/TiCN multilayer thick film showed different types of tribological behaviour against Si3N4 balls and steel balls. The mean coefficient of friction and the wear rate of the film were about 0.14 and 1.15 x 10(-6) mm(3) N-1 m(-1) when the film slid against Si3N4 balls for 1 h.