期刊
JOURNAL OF PHYSICS D-APPLIED PHYSICS
卷 45, 期 13, 页码 -出版社
IOP PUBLISHING LTD
DOI: 10.1088/0022-3727/45/13/135101
关键词
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资金
- US National Science Foundation (CMMI) [0928440]
- Directorate For Engineering
- Div Of Civil, Mechanical, & Manufact Inn [0928440] Funding Source: National Science Foundation
Zinc nitride films were deposited on glass or silicon substrates by reactive magnetron RF sputtering of zinc in N-2-Ar ambient. The deposition conditions were optimized in terms of substrate temperature and N-2/Ar sputtering gas ratio, and representative films were then studied by structure, optical and spectroscopy techniques, and electrical measurements. Spectroscopic ellipsometry and spectrophotometry measurements revealed that the material has a direct band gap close to 1.26 eV. Hall effect and resistivity measurements indicated n-type conductivity with a very high carrier concentration of about 10(21) cm(-3), mobility of up to 90 cm(2) V-1 s(-1), and resistivity of similar to 10(-3) Omega cm. X-ray photoelectron spectroscopy spectra clearly showed the existence of not only Zn-N bonding but also of a fraction of N-N bonding configurations, together with an oxidized surface. According to energy-dispersive x-ray spectroscopy analysis, the as-deposited films were almost stoichiometric and contained only a small fraction of oxygen.
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