期刊
JOURNAL OF PHYSICS D-APPLIED PHYSICS
卷 42, 期 23, 页码 -出版社
IOP PUBLISHING LTD
DOI: 10.1088/0022-3727/42/23/235402
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资金
- Scientific Research, Flanders (FWO)
- Concerted Action of the KULeuven [GOA/09/006]
- Inter-university Attraction Pole [IUAP P6/42]
- Center of Excellence Programme [INPAC EF/05/005]
We have accurately determined the thermal expansion coefficients of CoSi(2) and NiSi(2) using high-temperature x-ray diffraction in the temperature range 300-850 K, resolving the ambiguity in the values reported in the literature. The room temperature (298 K) linear thermal expansion coefficients (alpha = (1/a(0))(partial derivative a/partial derivative T)) for CoSi(2) and NiSi(2) are found to be alpha CoSi(2) = 14.4 +/- 0.6 x 10(-6)K(-1) and alpha(NiSi2) = 14.4 +/- 0.7 x 10(-6) K(-1), respectively. Our results, however, strongly suggest that the thermal expansion coefficient of NiSi(2) is temperature dependent and we recommend to use alpha(NiSi2) (T) = [(14.3 +/- 0.5) + (0.006 +/- 0.002) (T - 273K)] x 10(-6) K(-1) whenever an accurate value of the NiSi(2) thermal expansion coefficient is needed.
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