4.6 Article

On the thermal expansion coefficient of CoSi2 and NiSi2

期刊

出版社

IOP PUBLISHING LTD
DOI: 10.1088/0022-3727/42/23/235402

关键词

-

资金

  1. Scientific Research, Flanders (FWO)
  2. Concerted Action of the KULeuven [GOA/09/006]
  3. Inter-university Attraction Pole [IUAP P6/42]
  4. Center of Excellence Programme [INPAC EF/05/005]

向作者/读者索取更多资源

We have accurately determined the thermal expansion coefficients of CoSi(2) and NiSi(2) using high-temperature x-ray diffraction in the temperature range 300-850 K, resolving the ambiguity in the values reported in the literature. The room temperature (298 K) linear thermal expansion coefficients (alpha = (1/a(0))(partial derivative a/partial derivative T)) for CoSi(2) and NiSi(2) are found to be alpha CoSi(2) = 14.4 +/- 0.6 x 10(-6)K(-1) and alpha(NiSi2) = 14.4 +/- 0.7 x 10(-6) K(-1), respectively. Our results, however, strongly suggest that the thermal expansion coefficient of NiSi(2) is temperature dependent and we recommend to use alpha(NiSi2) (T) = [(14.3 +/- 0.5) + (0.006 +/- 0.002) (T - 273K)] x 10(-6) K(-1) whenever an accurate value of the NiSi(2) thermal expansion coefficient is needed.

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.6
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据