期刊
JOURNAL OF PHYSICS D-APPLIED PHYSICS
卷 41, 期 6, 页码 -出版社
IOP Publishing Ltd
DOI: 10.1088/0022-3727/41/6/062005
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We present a novel way to obtain heavily nitrogen doped anatase TiO2 films by using a solid-state nitrogen source. Epitaxial growth of the films was realized by introducing one unit-cell seed layer, which was indicated by reflection high-energy electron diffraction as intensity oscillation. Results of x-ray diffraction and x-ray photoelectron spectroscopy confirmed that the films were in the anatase phase heavily doped with nitrogen of similar to 15 at%. The films obtained exhibited considerable narrowing of the optical bandgap, resulting in an enhancement of absorption in the visible-light region.
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