Photoelectrochemical detection of oxidative DNA damage induced by Fenton Reaction with low concentration and DNA-associated Fe2+

The metal ion dependent decomposition of hydrogen peroxide, the so-called Fenton Reaction, yields hydroxyl radicals that can cause oxidative DNA damage both in vitro and in vivo. We have previously reported a photoelectrochemical sensor for the detection of oxidative DNA damage induced by an Fe2+-mediated Fenton Reaction, using a DNA intercalator as a photoelectrochemical signal reporter (Liang, M.; Guo, L.-H. Environ. Sci. Technol. 2007, 41, 658). The intercalator binds less to the damaged DNA in the sensor film than the native form, resulting in a reduction in the measured photocurrent. In this report, some mechanistic aspects of the sensor were investigated. It was found that Fe2+ alone (without the coexistence of H2O2) suppressed the photocurrent of the intercalator bound to the DNA film in a pH-dependent manner. Similar pH dependence was observed for the potential of the tin oxide nanoparticle colloid used in the preparation of the semiconductor electrode, leading to the hypothesis that the metal ion binds to the surface oxide groups on the electrode and quenches the photoelectrochemical response. At pH 3, the quenching effect was reduced substantially to permit the detection of DNA damage by as low as 10 mu M Fe2+ and 40 mu M H2O2, a concentration that is within the physiologically relevant range. It was also found that Fe2+ ions associated with the DNA in the sensor film and participated in the DNA damage reaction, a mechanism that has been implicated in previous studies on metal carcinogenesis.