4.2 Article

Fabrication of Cobalt Magnetic Nanostructures Using Atomic Force Microscope Lithography

期刊

JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY
卷 13, 期 12, 页码 8055-8058

出版社

AMER SCIENTIFIC PUBLISHERS
DOI: 10.1166/jnn.2013.8173

关键词

Cobalt; AFM Lithography; Metal Nanostructure

资金

  1. Nano Meterial Technology Development Program through the the National Research Foundation of Korea (NRF)
  2. Ministry of Education, Science and Technology (MEST) [2012035286]
  3. International Research and Development Program of the NRF
  4. MEST of Korea [K21003001810-11E0100-01510]
  5. Seoul RD Program [10919]
  6. National Research Foundation of Korea [2012M3A7B4035287] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)

向作者/读者索取更多资源

Cobalt nanopatterns are promising assemblies for patterned magnetic storage applications. The fabrication of cobalt magnetic nanostructures on n-tridecylamine center dot hydrochloride (TDA center dot HCl) self-assembled monolayer (SAM) modified silicon surfaces using direct writing atomic force microscope (AFM) lithography for localized electrochemical reduction of cobalt ions was demonstrated. The ions were reduced to form metal nanowires along the direction of the electricfield between the AFM tip and the substrate. In this lithography process, TDA center dot HCl SAMs play an important role in the lithography process for improving the resolution of cobalt nanopatterns by preventing nonspecific reduction of cobalt ions on the unwritten background. Cobalt nanowires and nanodots with width of 225 +/- 26 nm and diameter of 208 +/- 28 nm were successfully fabricated. Platinium-coated polydimethylsiloxane (PDMS) stamp was used fabricating bulk cobalt structures which can be detected by energy dispersive X-ray spectroscopy for element analysis and the physical and magnetic properties of these cobalt nanopatterns were characterized using AFM and magnetic force microscope.

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