期刊
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY
卷 11, 期 9, 页码 8206-8213出版社
AMER SCIENTIFIC PUBLISHERS
DOI: 10.1166/jnn.2011.5023
关键词
Plasma Processing; PE-CVD; Co3O4 Nanomaterials; Hydrogen Photo-Production; Gas Sensing
Plasma processing represents an attractive and versatile option for the fabrication of low-dimensional nanomaterials, whose chemical and physical properties can be conveniently tailored for the development of advanced technologies. In particular, Plasma Enhanced-Chemical Vapor Deposition (PE-CVD) is an appealing route to multi-functional oxide nanoarchitectures under relatively mild conditions, owing to the unique features and activation mechanisms of non-equilibrium plasmas. In this context, the potential of plasma-assisted fabrication in advanced nanosystem development is discussed. After a brief introduction on the basic categories of plasma approaches, the perspectives of application to CVD processes are commented, reporting on the growth and characterization of Co3O4 nanomaterials as a case study. Besides examining the interrelations between the material properties and the synthesis conditions, special focus is given to their emerging applications as catalysts for photo-assisted hydrogen production and solid state gas sensors.
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