Nanoscale selective growth and optical characteristics of quantum dots on III-V substrates prepared by diblock copolymer nanopatterning

an alternate Quantum Dot (QD) fabrication method to self-assembled SK mode QDs, diblock copolymer nano-patterned QDs were investigated. By employing selective growth of QDs on diblock copolymer nano-patterned masks, independence from the problematic wetting layer and controllability on QD size and distribution associated with SK growth mode QDs were realized. The diblock copolymer nano-patterned masks were fabricated using a diblock copolymer template and a dielectric mask, and InxGa1-xAs QDs were selectively grown on patterned GaAs and InP substrates by Metalorganic Chemical Vapor Deposition (MOCVD). The optical properties from diblock copolymer patterned QDs on III-V substrates were investigated at low temperature.