期刊
JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS
卷 11, 期 2, 页码 -出版社
SPIE-SOC PHOTO-OPTICAL INSTRUMENTATION ENGINEERS
DOI: 10.1117/1.JMM.11.2.021112
关键词
EUV; extreme ultraviolet lithography; plasma radiation source; laser- produced plasma; radiative hydrodynamics; RZLINE
类别
资金
- ASML team
An integrated model is developed to describe the hydrodynamics, atomic, and radiation processes that take place in extreme ultraviolet (EUV) radiation sources based on a laser-produced plasma with a distributed tin target. The modeling was performed using the RZLINE code-a numerical code for the simulation of EUV emission by hot dense plasmas. The purpose of the simulation is to evaluate the spectral characteristics of the radiation source, conversion efficiency, source size, evaporation rate of the target, energetic, and space distribution of debris (nanoparticles, neutrals, and ions). The advantages of a distributed target in comparison with a single droplet target are also discussed. (c) 2012 Society of Photo-Optical Instrumentation Engineers (SPIE). [DOI: 10.1117/1.JMM.11.2.021112]
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