相关参考文献
注意：仅列出部分参考文献，下载原文获取全部文献信息。A Route to Nanoscopic Materials via Sequential Infiltration Synthesis on Block Copolymer Templates
Qing Peng et al.
ACS NANO (2011)
Increased pattern transfer fidelity of ZEP 520A during reactive ion etching through chemical modifications by additional dosing of the electron beam resist
David A. Czaplewski et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B (2011)
Nanoscopic Patterned Materials with Tunable Dimensions via Atomic Layer Deposition on Block Copolymers
Qing Peng et al.
ADVANCED MATERIALS (2010)
Surface and sub-surface reactions during low temperature aluminium oxide atomic layer deposition on fiber-forming polymers
Joseph C. Spagnola et al.
JOURNAL OF MATERIALS CHEMISTRY (2010)
CMOS compatible strategy based on selective atomic layer deposition of a hard mask for transferring block copolymer lithography patterns
G. Gay et al.
NANOTECHNOLOGY (2010)
Improved etch resistance of ZEP 520A in reactive ion etching through heat and ultraviolet light treatment
David A. Czaplewski et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B (2009)
Robust Pattern Transfer of Nanoimprinted Features for Sub-5-nm Fabrication
Mark Schvartzman et al.
NANO LETTERS (2009)
Coating of Highly Porous Fiber Matrices by Atomic Layer Deposition
Marianna Kemell et al.
CHEMICAL VAPOR DEPOSITION (2008)
Selective-area atomic layer deposition using poly(methyl methacrylate) films as mask
Elina Farm et al.
JOURNAL OF PHYSICAL CHEMISTRY C (2008)
A top surface imaging method using area selective ALD on chemically amplified polymer photoresist films
Ashwini Sinha et al.
ELECTROCHEMICAL AND SOLID STATE LETTERS (2006)
Fabrication of metallic nanodots in large-area arrays by mold-to-mold cross imprinting (MTMCI)
S Kwon et al.
NANO LETTERS (2005)
Nucleation and growth during Al2O3 atomic layer deposition on polymers
CA Wilson et al.
CHEMISTRY OF MATERIALS (2005)
An experimentally validated analytical model for gate line-edge roughness (LER) effects on technology scaling
CH Díaz et al.
IEEE ELECTRON DEVICE LETTERS (2001)
Study of the fundamental contributions to line edge roughness in a 193 nm, top surface imaging system
MH Somervell et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B (2000)
分享论文
