期刊
JOURNAL OF MATERIALS CHEMISTRY
卷 21, 期 6, 页码 1859-1865出版社
ROYAL SOC CHEMISTRY
DOI: 10.1039/c0jm02907f
关键词
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资金
- National Science Foundation [095254, DMR05-20415]
- ConvEne IGERT [NSF-DGE 0801627]
Rapid deposition of epitaxial ZnO films has been demonstrated with a low temperature aqueous solution technique utilizing microwave heating. X-Ray diffraction analysis of films deposited on single crystal (111) MgAl(2)O(4) substrates revealed the ZnO to deposit epitaxially with an orientational relationship of ZnO [11 (2) over bar0]parallel to MgAl(2)O(4) [(1) over bar(1) over bar2] & ZnO [01 (1) over bar0]parallel to MgAl(2)O(4) [(1) over tilde 10]. By altering conditions of solution pH, ammonia concentration, heating rate, and hold time, the growth rate and morphology of the ZnO films can be modified. Using a pH 11, 1 mol L(-1) ammonia growth solution, an approximately 2 micron thick continuous ZnO film can be deposited in only 5 minutes at 90 degrees C. Compared to similar ZnO deposition conditions using conventional heating, the use of microwave heating resulted in substantially higher nucleation and growth rates. Using an explanation based on classical nucleation theory and predicted variations in ZnO solubility with temperature, the increase in nucleation and growth rate is attributed to the high heating rates achieved with microwave heating.
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