4.2 Article

Design, Fabrication and Measurement of Pyramid-Type Antireflective Structures on Columnar Crystal Silicon Lens for Millimeter-Wave Astronomy

期刊

JOURNAL OF LOW TEMPERATURE PHYSICS
卷 193, 期 5-6, 页码 976-983

出版社

SPRINGER/PLENUM PUBLISHERS
DOI: 10.1007/s10909-018-2047-4

关键词

Silicon lens; Antireflection coating; Subwavelength structure

资金

  1. JSPS KAKENHI [JP25247022, JP26247019, JP17H01115]
  2. Research Coordination Committee
  3. National Astronomical Observatory of Japan (NAOJ)
  4. National Institutes of Natural Sciences (NINS)
  5. Tokyo metropolitan government supporting funds

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Pyramid-type antireflective subwavelength structures for large-diameter (> 30 cm) silicon lenses are promising for broadband astronomical observations. The refractive index and dielectric loss tangent of the lens material, columnar crystal silicon which is manufactured by Mitsubishi Materials Electronic Chemicals Co., Ltd., were measured at around 30 K using a Martin-Puplett-type Fourier transform spectrometer. The measured refractive index and dielectric loss tangent between 200 GHz and 1.6 THz were similar to 3.42 and 1-5 x 10(-4), respectively. Three different pyramid-type structures with a period of 265 mu m and depth of 600 mu m were simulated to obtain their reflectance using an electromagnetic field simulator, HFSS. The structures were fabricated on both sides of a 100-mm-diameter plane-convex lens made of columnar crystal silicon with a 150-mm radius of curvature using a metal-bonded V-shaped blade and a dedicated three-axis machine. The fabrication errors in the period and depth were less than 10 mu m. The reflectance of the lens flat surface was measured using a vector network analyzer to be between -8 and -17 dB in the range of 110-170 GHz, which was consistent with the result from the simulation.

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